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Laser Heating of a Silicon Wafer

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Hello, I am a novice in COMSOL. I have designed my own model based on "laser heating of a silicon wafer tutorial" https://www.comsol.com/model/laser-heating-of-a-silicon-wafer-13835

Can someone tell me why the maximum temperature in the above mentioned tutorial has fluctuation? What should I do to obtain a smooth profile for the maximum temperature?


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